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Jón Tómas Guðmundsson - Professor

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School of Engineering and Natural Sciences

Jón Tómas Guðmundsson

Professor

Location
VR-3 / V03-213
Phone
525 - 4946
Email
tumi [at] hi.is

Unit
Faculty of Physical Sciences
Website
http://www.raunvis.hi.is/~tumi

Published works

2023

Field reversal in low pressure, unmagnetized radio frequency capacitively coupled argon plasma dischargesApplied Physics Letters
Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering dischargesJournal of Vacuum Science & Technology A
On the importance of excited state species in low pressure capacitively coupled plasma argon dischargesPlasma Sources Science and Technology
Target ion and neutral spread in high power impulse magnetron sputteringJournal of Vacuum Science & Technology A
High power impulse magnetron sputtering of tungsten: a comparison of experimental and modelling resultsPlasma Sources Science and Technology
Epitaxial growth and characterization of (001) [NiFe/M]20 (M = Cu, CuPt and Pt) superlatticesSurfaces and Interfaces
Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering dischargesPlasma Sources Science and Technology
Insights into the copper HiPIMS discharge: deposition rate and ionised flux fractionPlasma Sources Science and Technology

2022

Particle-in-Cell Simulations With Fluid Metastable Atoms in Capacitive Argon Discharges: Electron Elastic Scattering and Plasma Density Profile TransitionIEEE Transactions on Plasma Science
Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering dischargeJournal of Physics D: Applied Physics
Operating modes and target erosion in high power impulse magnetron sputteringJournal of Vacuum Science & Technology A
On the population density of the argon excited levels in a high power impulse magnetron sputtering dischargePhysics of Plasmas
Foundations of physical vapor deposition with plasma assistancePlasma Sources Science and Technology
Modeling of high power impulse magnetron sputtering discharges with tungsten targetPlasma Sources Science and Technology
Ionization region model of high power impulse magnetron sputtering of copperSurface and Coatings Technology

2021

HiPIMS optimization by using mixed high-power and low-power pulsingPlasma Sources Science and Technology
On the electron energy distribution function in the high power impulse magnetron sputtering dischargePlasma Sources Science and Technology
On the role of ion potential energy in low energy HiPIMS deposition: An atomistic simulationSurface and Coatings Technology
Tailoring interface alloying and magnetic properties in (111) Permalloy/Pt multilayersJournal of Magnetism and Magnetic Materials
Generating ultradense pair beams using 400
GeV/c
protonsPhysical Review Research
Electron power absorption in radio frequency driven capacitively coupled chlorine dischargePlasma Sources Science and Technology
On how to measure the probabilities of target atom ionization and target ion back-attraction in high-power impulse magnetron sputteringJournal of Applied Physics
Benchmarked and upgraded particle-in-cell simulations of a capacitive argon discharge at intermediate pressure: the role of metastable atomsPlasma Sources Science and Technology
Surface effects in a capacitive argon discharge in the intermediate pressure regimePlasma Sources Science and Technology
Modeling of high power impulse magnetron sputtering discharges with graphite targetPlasma Sources Science and Technology

2020

Collisionless electron cooling in a plasma thruster plume: experimental validation of a kinetic modelPlasma Sources Science and Technology
Study of the transition from self-organised to homogeneous plasma distribution in chromium HiPIMS dischargeJournal of Physics D: Applied Physics
Tailored voltage waveforms applied to a capacitively coupled chlorine dischargePlasma Sources Science and Technology
Electron power absorption dynamics in a low pressure radio frequency driven capacitively coupled discharge in oxygenJournal of Applied Physics
Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputteringJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputteringPlasma Sources Science and Technology
Physics and technology of magnetron sputtering dischargesPlasma Sources Science and Technology
Structural and photoluminescence study of TiO2 layer with self-assembled Si1−xGex nanoislandsJournal of Applied Physics
Optimization of HiPIMS discharges: The selection of pulse power, pulse length, gas pressure, and magnetic field strengthJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Effect of substrate bias on microstructure of epitaxial film grown by HiPIMS: An atomistic simulationJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Obtaining SiGe nanocrystallites between crystalline TiO2 layers by HiPIMS without annealingApplied Surface Science

2019

Fabrication and characterization of Si1−xGex nanocrystals in as-grown and annealed structures: a comparative studyBeilstein Journal of Nanotechnology
Efficacy of annealing and fabrication parameters on photo-response of SiGe in TiO2 matrixNanotechnology
Enhanced photoconductivity of embedded SiGe nanoparticles by hydrogenationApplied Surface Science
Fabrication and characterization of Si1-xGex nanocrystals in as-grown and annealed structures: A comparative study
Electron heating mode transitions in a low pressure capacitively coupled oxygen dischargePlasma Sources Science and Technology
Effect of atomic ordering on the magnetic anisotropy of single crystal Ni80Fe20AIP Advances
A global model study of low pressure high density CF4 dischargePlasma Sources Science and Technology
Oblique angle deposition of nickel thin films by high-power impulse magnetron sputteringBeilstein Journal of Nanotechnology
Enhanced photoconductivity of SiGe nanocrystals in SiO2 driven by mild annealingApplied Surface Science
The Effect of Magnetic Field Strength and Geometry on the Deposition Rate and Ionized Flux Fraction in the HiPIMS DischargePlasma

2018

The role of surface quenching of the singlet delta molecule in a capacitively coupled oxygen dischargePlasma Sources Science and Technology
The Influence of Secondary Electron Emission and Electron Reflection on a Capacitively Coupled Oxygen DischargeAtoms
The frequency dependence of the discharge properties in a capacitively coupled oxygen dischargePlasma Sources Science and Technology
Comparison of magnetic and structural properties of permalloy Ni80Fe20 grown by dc and high power impulse magnetron sputteringJournal of Physics D: Applied Physics
Growth of HfN thin films by reactive high power impulse magnetron sputteringAIP Advances
On three different ways to quantify the degree of ionization in sputtering magnetronsPlasma Sources Science and Technology

2017

A study of the oxygen dynamics in a reactive Ar/O2 high power impulse magnetron sputtering discharge using an ionization region modelJournal of Applied Physics
Foundations of DC plasma sourcesPlasma Sources Science and Technology
A unified treatment of self-sputtering, process gas recycling, and runaway for high power impulse sputtering magnetronsPlasma Sources Science and Technology
Particle-balance models for pulsed sputtering magnetronsJournal of Physics D: Applied Physics
On electron heating in a low pressure capacitively coupled oxygen dischargeJournal of Applied Physics
Vanadium and vanadium nitride thin films grown by high power impulse magnetron sputteringJournal of Physics D: Applied Physics
Non-Maxwellian electron energy probability functions in the plume of a SPT-100 Hall thrusterPlasma Sources Science and Technology
On singlet metastable states, ion flux and ion energy in single and double frequency capacitively coupled oxygen dischargesJournal of Physics D: Applied Physics
Preface to Special Topic: Reactive high power impulse magnetron sputteringJournal of Applied Physics

2016

On reactive high power impulse magnetron sputteringPlasma Physics and Controlled Fusion
The Role of Ohmic Heating in dc Magnetron SputteringPlasma Sources Science and Technology
An ionization region model of the reactive Ar/O2 high power impulse magnetron sputtering dischargePlasma Sources Science and Technology
The role of the metastable O2(b1\Sigma_g^+) and energy-dependent secondary electron emission yields in capacitively coupled oxygen dischargesPlasma Sources Science and Technology

2015

On the formation and annihilation of the singlet molecular metastables in an oxygen dischargeJournal of Physics D-Applied Physics
A volume averaged global model study of the influence of the electron energy distribution and the wall material on an oxygen dischargeJournal of Physics D-Applied Physics
Dual-frequency capacitively coupled chlorine dischargePlasma Sources Science & Technology
Are the argon metastables important in high power impulse magnetron sputtering discharges?Physics of Plasmas
The pressure dependence of the discharge properties in a capacitively coupled oxygen dischargeJournal of Applied Physics
On the role of metastables in capacitively coupled oxygen dischargesPlasma Sources Science & Technology

2014

A current driven capacitively coupled chlorine dischargePlasma Sources Science & Technology
On the road to self-sputtering in high power impulse magnetron sputtering: particle balance and discharge characteristicsPlasma Sources Science & Technology
Ion Energy and Angular Distributions in a Dual-Frequency Capacitively Coupled Chlorine DischargeIeee Transactions on Plasma Science

2013

A benchmark study of a capacitively coupled oxygen discharge of the oopd1 particle-in-cell Monte Carlo codePlasma Sources Science & Technology
A particle-in-cell/Monte Carlo simulation of a capacitively coupled chlorine dischargePlasma Sources Science & Technology
On sheath energization and Ohmic heating in sputtering magnetronsPlasma Sources Science and Technology
The properties of TiN ultra-thin films grown on SiO2 substrate by reactive high power impulse magnetron sputtering under various growth anglesThin Solid Films
Ultra-thin poly-crystalline TiN films grown by HiPIMS on MgO(100) - In-situ resistance study of the initial stage of growthThin Solid Films
Rutile TiO 2 thin films grown by reactive high power impulse magnetron sputteringThin Solid Films

2012

Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulsesPlasma Sources Science and Technology
High power impulse magnetron sputtering dischargeJournal of Vacuum Science & Technology a
Comparing resonant photon tunneling via cavity modes and Tamm plasmon polariton modes in metal-coated Bragg mirrorsOptics Letters
Nucleation and Resistivity of Ultrathin TiN Films Grown by High-Power Impulse Magnetron SputteringIEEE Electron Device Letters
Current-voltage-time characteristics of the reactive Ar/O-2 high power impulse magnetron sputtering dischargeJournal of Vacuum Science & Technology a
The influence of the electron energy distribution on the low pressure chlorine dischargeVacuum

2011

An ionization region model for high-power impulse magnetron sputtering dischargesPlasma Sources Science & Technology
Morphology of TiN thin films grown on SiO(2) by reactive high power impulse magnetron sputteringThin Solid Films
Growth and in-situ electrical characterization of ultrathin epitaxial TiN films on MgOThin Solid Films
Ar(+) and Xe(+) Velocities near the Presheath-Sheath Boundary in an Ar/Xe DischargePhysical Review Letters
Current-voltage-time characteristics of the reactive Ar/N(2) high power impulse magnetron sputtering dischargeJournal of Applied Physics

2010

A global (volume averaged) model of a Cl(2)/Ar discharge: II. Pulsed power modulationJournal of Physics D-Applied Physics
On the film density using high power impulse magnetron sputteringSurface and Coatings Technology
Effect of hydrogenation on minority carrier lifetime in low-grade siliconPhysica Scripta
The low pressure Cl(2)/O(2) discharge and the role of ClOPlasma Sources Science & Technology
A global (volume averaged) model of a Cl(2)/Ar discharge: I. Continuous powerJournal of Physics D-Applied Physics
The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition toolVacuum
Low pressure hydrogen discharges diluted with argon explored using a global modelPlasma Sources Science & Technology
A global (volume averaged) model of a chlorine dischargePlasma Sources Science & Technology
Morphology of TiN thin films grown on MgO(001) by reactive dc magnetron sputteringJournal of Vacuum Science & Technology A

2009

On the electron energy in the high power impulse magnetron sputtering dischargeJournal of Applied Physics
A global (volume averaged) model of a nitrogen discharge: II. Pulsed power modulationPlasma Sources Science & Technology
A global (volume averaged) model of a nitrogen discharge: I. Steady statePlasma Sources Science & Technology
In-situ electrical characterization of ultrathin TiN films grown by reactive dc magnetron sputtering on SiO(2)Thin Solid Films

2008

Electrical resistivity and morphology of ultra thin Pt films grown by dc magnetron sputtering on SiO(2)Proceedings of the 17th International Vacuum Congress/13th International Conference on Surface Science/International Conference on Nanoscience and Technology
Ionization mechanism in the high power impulse magnetron sputtering (HiPIMS) dischargeProceedings of the 17th International Vacuum Congress/13th International Conference on Surface Science/International Conference on Nanoscience and Technology
Digital smoothing of the Langmuir probe I-V characteristicReview of Scientific Instruments
Growth, coalescence, and electrical resistivity of thin Pt films grown by dc magnetron sputtering on SiO(2)Applied Surface Science
Ionized physical vapor deposition (IPVD): Magnetron sputtering dischargesProceedings of the 17th International Vacuum Congress/13th International Conference on Surface Science/International Conference on Nanoscience and Technology
Plasma parameters in a planar dc magnetron sputtering discharge of argon and kryptonProceedings of the 17th International Vacuum Congress/13th International Conference on Surface Science/International Conference on Nanoscience and Technology

2007

A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurementsReview of Scientific Instruments
Oxygen discharges diluted with argon: dissociation processesPlasma Sources Science & Technology

2006

Ionized physical vapor deposition (IPVD): A review of technology and applicationsThin Solid Films
Improved volume-averaged model for steady and pulsed-power electronegative dischargesJournal of Vacuum Science & Technology A
In situ resistivity measurements during growth of ultra-thin Cr0.7Mo0.3Thin Solid Films
The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering dischargeThin Solid Films

2005

Spatial electron density distribution in a high-power pulsed magnetron dischargeIEEEE Transactions on Plasma Science
Plasma dynamics in a highly ionized pulsed magnetron dischargePlasma Sources Science & Technology
Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfacesJournal of Vacuum Science & Technology A
Ion-acoustic solitary waves in a high power pulsed magnetron sputtering dischargeJournal of Physics D-Applied Physics

2004

Lithium-diffused and annealed GaAs: An admittance spectroscopy studyPhysical Review B
Recombination and detachment in oxygen discharges: the role of metastable oxygen moleculesJournal of Physics D-Applied Physics
Preparation and characterization of magnetron sputtered, ultra-thin Cr0.63Mo0.37 films on MgOJournal of Vacuum Science & Technology A

2003

Impurity band in lithium-diffused and annealed GaAs: Conductivity and Hall effect measurementsPhysical Review B
Frequency-dependent conductivity in lithium-diffused and annealed GaAsPhysica B-Condensed Matter

2002

Potential fluctuations and site switching in Si-doped GaAs studied by photoluminescencePhysica Scripta
Global model of plasma chemistry in a low-pressure O(2)/F(2) dischargeJournal of Physics D-Applied Physics
Spatial and temporal behavior of the plasma parameters in a pulsed magnetron dischargeSurface & Coatings Technology
Hopping conduction in lithium diffused and annealed GaAs2002 12th International Conference on Semiconducting & Insulating Materials

2001

Electronegativity of low-pressure high-density oxygen dischargesJournal of Physics D-Applied Physics
Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron dischargeApplied Physics Letters
The effect of Si site-switching in GaAs on electrical properties and potential fluctuationPhysica B: Condensed Matter
On the effect of the electron energy distribution on the plasma parameters of an argon discharge: a global (volume-averaged) model studyPlasma Sources Science & Technology

2000

A reply to a comment on: 'On the plasma parameters of a planar inductive oxygen dischargeJournal of Physics D-Applied Physics
On the plasma parameters of a planar inductive oxygen dischargeJournal of Physics D-Applied Physics
Direct observation of hydrogen passivation of nitrogen-related energy levels in ZnSe and ZnSxSe1-x grown by MBEJournal of Crystal Growth

1999

Hydrogenation of polysilicon thin-film transistor in a planar inductive H-2/Ar dischargeIeee Electron Device Letters
Hydrogen passivation of nitrogen-related energy levels in ZnSe and ZnSSe grown by MBEPhysica B-Condensed Matter
Effect of lithium diffusion on the native defects in GaAs studied by positron annihilation spectroscopyPhysica B-Condensed Matter
Experimental studies of O-2/Ar plasma in a planar inductive dischargePlasma Sources Science & Technology
Hydrogen passivation of Al(x)Ga(1-x)As/GaAs studied by surface photovoltage spectroscopyPhysica B-Condensed Matter
The ion energy distribution in a planar inductive oxygen dischargeJournal of Physics D-Applied Physics
Ion energy distribution in H-2/Ar plasma in a planar inductive dischargePlasma Sources Science & Technology
Lithium-gold-related complexes in p-type crystalline siliconPhysica B-Condensed Matter

1998

Magnetic induction and plasma impedance in a planar inductive dischargePlasma Sources Science & Technology
Experimental studies of H-2/Ar plasma in a planar inductive dischargePlasma Sources Science & Technology
Model and measurements for a planar inductive oxygen dischargePlasma Sources Science & Technology

1997

Magnetic induction and plasma impedance in a cylindrical inductive dischargePlasma Sources Science & Technology

1992

ELECTRICAL AND OPTICAL-PROPERTIES OF GAAS DOPED WITH LIProceedings of the 16th International Conference on Defects in Semiconductors, Pts 1-3

Keywords for Specialisation:

Discharge physics

Magnetron sputtering discharges

Electrical properties of materials

Capacitively coupled discharges

Particle-in-cell

Semiconductors and semiconductor devices